Computer analysis of capacitance phenomena in nitride VCSELs

This paper presents computer simulations of nitride vertical-cavity surface-emitting lasers, emitting at 405 nm. The analysis is focused on capacitance phenomena occurring in these lasers, which are important for potential applications in optical links. A significant difference in the active currents is observed between the two analyzed structures with tunnel junction (TJ) and implantation, and the structure with an ITO electrode. The structure with TJ and thick implantation seems to be the most favorable from the point of view of capacitance properties.