Chemical Solution Deposition of MTiO₃(M = Ca, Sr, and Ba) Based Buffer Layer Prior to Coated Conductors Architectures

Chemical solution deposition (CSD) approach was introduced in this work to simplify and to optimize the trifluoracetic based M TiO ₃ ( M TO, M = Ca, Sr, and Ba) precursor solution, leading to the high shelf-life and the purity. Growing these M TO solutions on (100) LaAlO ₃ single-crystal substrates yields (h00) oriented and dense M TO buffer layers. Whereas it is clear that the roughness of M TO films and the lattice mismatch between M TO buffer layer and superconducting YBa ₂ Cu ₃ O _7-δ film is crucial for the film formation.