Nanoporous Metal-Organic Framework Thin Films Prepared Directly from Gaseous Precursors by Atomic and Molecular Layer Deposition: Implications for Microelectronics.

Jenna Multia,Dmitry E Kravchenko,Víctor Rubio-Giménez,Anish Philip,Rob Ameloot,Maarit Karppinen

ACS applied nano materials（2023）

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摘要

Atomic/molecular layer deposition (ALD/MLD) allows for the direct gas-phase synthesis of crystalline metal-organic framework (MOF) thin films. Here, we show for the first time using krypton and methanol physisorption measurements that ALD/MLD-fabricated copper 1,4-benzenedicarboxylate (Cu-BDC) ultrathin films possess accessible porosity matching that of the corresponding bulk MOF.

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关键词

atomic layer deposition,molecular layer deposition,porous thin films,krypton physisorption,methanol physisorption,metal-organic framework

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