Non-fully gold nanohole array fabricated by nanoimprint lithography

We reported the fabrication process of non-fully gold nanohole arrays with lattice constant of 600 nm using nanoimprint lithography (NIL) technique, including the fabrication of Si/SiO2 master mold, the preparation of Ormostamp mold as negative replication stamp, the UV nanoimprint process, three dry etching steps and finally the Cr wet etching step. The successfully fabricated non-fully gold nanohole array is of interest for studying the next enhanced optical transmission (EOT) plasmonic sensing application.