Research-based on color uniformity of semiconductor laser

10TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: NOVEL OPTOELECTRONIC FUNCTIONAL MATERIALS AND DEVICES(2021)

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摘要
In recent years, the Laser display has drawn wide attention due to its large color gamut and high brightness. However, the poor uniformity of color and illumination induced by the monochromatic laser has become an urgent technical problem to solve. In this work, we designed a new optical illumination frame, added a Gaussian 2 degrees diffuser at the diffuse 1 position, expanded and shimmed the laser beam, and uniquely added an achromatic half-wave plate in front of the two red array lasers. To verify the improvement of this optical illumination frame on the illumination and color uniformity, we built a laser illumination system by using a Hitachi NUMM31 model 4*7 array laser, 639nm, 643nm 2*7 red array laser, 525nm 1*7 green array laser, and 465nm 1*7 blue array laser. Moreover, the simulation of color uniformity was conducted by lighttools. The result of color uniformity is.x=0.08 and.y=0.01. As a result, the color uniformity of our new optical illumination frame below 0.015 was achieved, while the color uniformity of Hisense products is 0.025. This newly developed optical illumination frame has the high potential to provide a facile pathway to realize high color and illumination uniformity by using diffusers and an achromatic half-wave plate.
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关键词
Semiconductor laser, Projection system, Color uniformity, Projection display
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