Standard Cell Design Optimization with Advanced MOL Technology in 3nm GAA Process.

Symposium on VLSI Technology (VLSI Technology)(2022)

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摘要
In this paper, standard cell design challenges for the 3nm process are introduced, solved, and optimized using the advanced MOL technology, AC P–N connection. In this methodology, each drain nodes of P and NMOS are connected using a single MOL layer (AC). Utilizing the AC P–N connection, standard cell library can be improved in three different ways. First, reduce the parasitic wire resistance by more than 20% and improve circuit reliability by alleviating a high current density. Second, Ceff improvement by composing only the MOL layer (AC) for the output node of the cell improves the standard cell speed up to 9.6%. Third, we propose a novel Flip-Flop (FF) structure optimized for AC P–N connection, thus improving the speed of the FF (1/T D2Q ) by 9.1%.
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关键词
flip-flop,current density,circuit reliability,NMOS,PMOS,AC P-N connection,standard cell speed,Ceff improvement,parasitic wire resistance,standard cell library,single MOL layer,drain nodes,GAA process,advanced MOL technology,standard cell design optimization,size 3.0 nm
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