MOVPE and its future production challenges
Journal of Crystal Growth(2022)
摘要
•VCSEL Wafer diameters on GaAs were initially developed at 100 mm and rapidly expanded to 150 mm.•Improved uniformity in reflectivity, thickness and composition.•150 mm VCSELs on GaAs were qualified from a newly constructed state-of-the-art epi-foundry.•New substrate material was considered – Ge demonstrated significantly reduced wafer bow, zero EPD substrate with minimal slip.•Growth of VCSELs on 200 mm wafers.
更多查看译文
关键词
A3.Metalorganic Vapour Phase Epitaxy,B3.Laser diodes,B2.Semiconducting III-V materials,B1.Gallium compounds,B2.Semiconducting gallium arsenide,A1.Substrates
AI 理解论文
溯源树
样例
![](https://originalfileserver.aminer.cn/sys/aminer/pubs/mrt_preview.jpeg)
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要