MOVPE and its future production challenges

Journal of Crystal Growth(2022)

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摘要
•VCSEL Wafer diameters on GaAs were initially developed at 100 mm and rapidly expanded to 150 mm.•Improved uniformity in reflectivity, thickness and composition.•150 mm VCSELs on GaAs were qualified from a newly constructed state-of-the-art epi-foundry.•New substrate material was considered – Ge demonstrated significantly reduced wafer bow, zero EPD substrate with minimal slip.•Growth of VCSELs on 200 mm wafers.
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关键词
A3.Metalorganic Vapour Phase Epitaxy,B3.Laser diodes,B2.Semiconducting III-V materials,B1.Gallium compounds,B2.Semiconducting gallium arsenide,A1.Substrates
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