Influence of growth temperature on microstructural and electromagnetic properties of nickel thin films

Nickel thin films were grown on quartz substrates in ultra-high vacuum at laser fluence of 98 J/cm(2) using pulsed laser deposition. Effects of substrate temperature on the electromagnetic properties of the films were investigated. XRD data reveal crystalline growth at substrate temperature (T-s) of 500 degrees C. Roughness of the thin films at T-s of 100 degrees C was noted as 8 nm which was decreased to 3 nm at 500 degrees C. Coercive field and electrical resistivity were decreased from 10 to 5 mT and 0.71 to 0.064 mu omega-m, respectively, at higher substrate temperature. Magnetoresistance for both modes of configuration and Hall mobility were decreased, while carrier density and Hall coefficient showed opposite behavior with increased substrate temperature.