A Robust Scalable ESD Protection Device integrating Drain side Floating P+ Diffusion with tunable ESD Design Window and effective Latch-up immunity for High-Voltage Power Clamp applications
2022 44th Annual EOS/ESD Symposium (EOS/ESD)（2022）
关键词
tunable ESD Design Window,effective Latch-up immunity,High-Voltage power clamp applications,effective High Voltage Supply Pin ESD protection,low-cost BCDLite process,Conventional Medium Voltage Gate-Grounded N-type Metal-Oxide-Semiconductor,voltage applications,holding voltages,power clamps,adaptable ESD Design Window,high Latch-up immunity,wide voltage spectrum,Drain N+ Diffusion pullback,critical design parameters,Diffusion relative,ESD performance,scalable device architecture,silicon measurement results,robust scalable ESD protection device,footprint-efficient Electrostatic Discharge protection device,size 130.0 nm,voltage 8.0 V,voltage 40.0 V,time 100.0 ns
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