Area-selective atomic layer deposition of Ru thin films using phosphonic acid self-assembled monolayers for metal/dielectric selectivity

•For potential AS-ALD applications, metal/dielectric selectivity was investigated.•Selective chemisorption of phosphonic acid SAMs was confirmed on TiN and W surfaces.•Blocking capability of SAMs with different ligands was evaluated against Ru ALD.•Ru AS-ALD was successfully demonstrated on metal/dielectric-patterned substrates.