Slope error correction on X-ray reflection gratings by a variation of the local line density

The patterning of x-ray grating surfaces by electron-beam lithography offers large flexibility to realize complex optical functionalities. Here, we report on a proof-of-principle experiment to demonstrate the correction of slope errors of the substrates by modulating the local density of the grating lines. A surface error map of a test substrate was determined by optical metrology and served as the basis for an aligned exposure of a corrected grating pattern made by electron-beam lithography. The correction is done by a variation of the local line density in order to compensate for the local surface error. Measurements with synchrotron radiation and simulations in the soft X-ray range confirm that the effects of slope errors were strongly reduced over an extended wavelength range.(c) 2022 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement