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EUV Based Multi-Patterning Schemes for Advanced DRAM Nodes

Sayantan Das,Kaushik Sah,Roberto Fallica, Zhijin Chen,Sandip Halder,Andrew Cross,Danilo De Simone, Fergo Treska,Philippe Leray,Ryoung Han Kim,Ethan Maguire,Chih- Wei,Germain Fenger,Neal Lafferty,Jeonghoon Lee

ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXIX（2022）

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