Chrome Extension
WeChat Mini Program
Use on ChatGLM
VIPCreated with Sketch.

Lithography

Mark Neisser,Harry J. Levinson,Stefan Wurm, David Kyser,Takeo Watanabe, Ken Macwilliams, Hidemi Ishiuchi, Walt Trybula, Naoya Hayashi, Ted Fedynyshyn,Craig Higgins, Tsuyoshi Nakamura, Doug Resnick,Moshe Preil,Michael Lercel,Hajime Aoyama,Erik Hosler

2021 IEEE International Roadmap for Devices and Systems Outbriefs（2021）

Cited 0|Views15
No score
Abstract
Historically, improvements in lithography have enabled improved chip technologies. The International Roadmap for Devices and Systems (IRDS) Lithography roadmap predicts where current patterning capability can support future chip generations and where challenges and improvements are needed. It is intended to be used by semiconductor industry participants, by industry analysts, and by researchers who want or need to know how the industry will evolve in the future and what challenges need to be addressed.
More
Translated text
Key words
Lithography,IRDS,Roadmap,Patterning
AI Read Science
Must-Reading Tree
Example
Generate MRT to find the research sequence of this paper
Chat Paper
Summary is being generated by the instructions you defined