SEM EDS Mapping of Ultra-Low Energy X-rays Using a Silicon Nitride Window Silicon Drift Detector

Shangshang Mu,Jens Rafaelsen, Masanobu Kawabata

Microscopy and Microanalysis(2022)

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摘要
Journal Article SEM EDS Mapping of Ultra-Low Energy X-rays Using a Silicon Nitride Window Silicon Drift Detector Get access Shangshang Mu, Shangshang Mu EDAX LLC., Ametek Materials Analysis Division, Pleasanton, CA, United States Corresponding author: shangshang.mu@ametek.com Search for other works by this author on: Oxford Academic Google Scholar Jens Rafaelsen, Jens Rafaelsen EDAX LLC., Ametek Materials Analysis Division, Pleasanton, CA, United States Search for other works by this author on: Oxford Academic Google Scholar Masanobu Kawabata Masanobu Kawabata EDAX LLC., Ametek Materials Analysis Division, Pleasanton, CA, United States Search for other works by this author on: Oxford Academic Google Scholar Microscopy and Microanalysis, Volume 28, Issue S1, 1 August 2022, Pages 572–573, https://doi.org/10.1017/S1431927622002860 Published: 01 August 2022
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关键词
silicon,detector,ultra-low,x-rays
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