Ways to Suppress Electron Beam Damage Using High-Speed Electron Beam Control by Electrostatic Shutter in Sample Observation and Analysis

Journal Article Ways to Suppress Electron Beam Damage Using High-Speed Electron Beam Control by Electrostatic Shutter in Sample Observation and Analysis Get access Hiroki Hashiguchi, Hiroki Hashiguchi JEOL Ltd. Akishima, Tokyo, Japan Corresponding author: hhashigu@jeol.co.jp Search for other works by this author on: Oxford Academic Google Scholar Kazuki Yagi, Kazuki Yagi JEOL Ltd. Akishima, Tokyo, Japan Search for other works by this author on: Oxford Academic Google Scholar Yu Jimbo, Yu Jimbo JEOL Ltd. Akishima, Tokyo, Japan Search for other works by this author on: Oxford Academic Google Scholar Ryusuke Sagawa, Ryusuke Sagawa JEOL Ltd. Akishima, Tokyo, Japan Search for other works by this author on: Oxford Academic Google Scholar Ruth Shewmon Bloom, Ruth Shewmon Bloom Integrated Dynamic Electron Solution Inc., Pleasanton, CA, USA Search for other works by this author on: Oxford Academic Google Scholar Bryan Reed, Bryan Reed Integrated Dynamic Electron Solution Inc., Pleasanton, CA, USA Search for other works by this author on: Oxford Academic Google Scholar Sang Tae Park, Sang Tae Park Integrated Dynamic Electron Solution Inc., Pleasanton, CA, USA Search for other works by this author on: Oxford Academic Google Scholar Daniel J Masiel, Daniel J Masiel Integrated Dynamic Electron Solution Inc., Pleasanton, CA, USA Search for other works by this author on: Oxford Academic Google Scholar Ichiro Ohnishi Ichiro Ohnishi JEOL Ltd. Akishima, Tokyo, Japan Search for other works by this author on: Oxford Academic Google Scholar Microscopy and Microanalysis, Volume 28, Issue S1, 1 August 2022, Pages 2200–2201, https://doi.org/10.1017/S1431927622008492 Published: 01 August 2022