Highly selective isotropic chemical dry etching for gate-all-around devices: nanosheet, forksheet and complementary FETs
Advanced Etch Technology and Process Integration for Nanopatterning XI(2022)
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要
Advanced Etch Technology and Process Integration for Nanopatterning XI(2022)