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Single Mask Solution to Pattern BLP and SNLP Using 0.33NA EUV for Next-Generation DRAM Manufacturing

Kaushik Sah,Andrew Cross,Sayantan Das,Roberto Fallica,Jeonghoon Lee,Ryoung-Han Kim,Sandip Halder,Ethan Maguire,Ana-Maria Armeanu,Monica Sears,Neal Lafferty,Vlad Liubich,Chih- Wei,Germain Fenger

DTCO and Computational Patterning II（2023）

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关键词
Patterning Materials,High-Resolution Patterning,Mask Design,Nanoprobing,Nanomaterials Characterization
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