Improving the precision of semiconductor overlay measurements using dark-field digital holographic microscopy

M. Adhikary, T. Cromwijk,C. Messinis, J. de Wit, S. Konijnenberg,S. Witte, J. de Boer, A. J. den Boef

Imaging and Applied Optics Congress 2022 (3D, AOA, COSI, ISA, pcAOP)（2022）

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摘要

We present dark-field digital holographic microscopy for diffraction-based overlay metrology in semiconductor layers with feature size of a few nanometers. We aim for higher accuracy and precision by calibrating the illumination profile on the targets.

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关键词

semiconductor overlay measurements,digital holographic microscopy,precision,dark-field

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