Imaging quality evaluation of superlens based nanolithography

Imaging capability of surface plasma based nano-patterning is discussed in this article. The imaging capability of 1:1 imaging ratio is the basis, which is different with the interference lithography with the frequency multiplication on the image plan. In this article, "Superlens" is discussed. The imaging capability evaluation is based on the rigorous electromagnetic modelling of Finite Element Method. Theoretical analysis and numerical evaluation are given, detailed impact evaluation of a variety of important parameters to the imaging capability is presented.