Effect of the energy density deposited by a 3.66-MeV Nickel ion beam on the sputtering yield of a hypereutectic alloy

Dilute alloys of Ni-Si binary system have been used as base material to study microstructural changes caused by irradiation in complex alloys. However, non-dilute Ni-Si alloys, which are themselves also important for high-temperature applications, have been little studied under irradiation. In this paper, the behavior of a hypereutectic alloy, Ni22at.%Si, under severe irradiation conditions is evaluated, to determine changes induced on the surface and elucidate the possible mechanisms that promote them. As a result of irradiating this alloy with Ni ions of 3.66 MeV at 650 degrees C and an incidence perpendicular to the surface, the presence of nanohills is detected, as well as groove patterns and craters, which formation is attributed to different sputtering mechanisms. To characterize these changes, optical, scanning electron and atomic force microscopies were used. Comparing the experimental findings with some of the most important physical models of sputtering, it was concluded that such changes to the surface microstructure strongly depend on the amount of energy deposited during irradiation and on how it is distributed in the microstructural features developed in the alloy during its manufacture. Moreover, when the radiation dose was changed to evaluate the sputtering yield as a dose function, it was detected as geometric sputtering mechanism.