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Effects of JFET Region Design and Gate Oxide Thickness on the Static and Dynamic Performance of 650 V SiC Planar Power MOSFETs

Materials(2022)

Cited 7|Views18
Key words
SiC power MOSFET,JFET width,JFET doping concentration,gate oxide thickness,orthogonal P,layout,gate-drain capacitance,high-frequency figure-of-merit (HF-FOM)
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