Achieving zero EUV patterning defect with dry photoresist system
Mohammed Alvi,Richard Gottscho, Ali Haider, Seongjun Heo, PingYen Hsieh, Ching-Chung Huang,Gosia Jurczak,Benjamin Kam, Ji Yeon Kim, Billie Li, Da Li, Henry Nguyen,Yang Pan, Daniel Peter,Nader Shamma,Anuja De Silva,Samantha Tan, Ethen Wang,Timothy Weidman,Rich Wise, Morrey Wu,Elisseos Verveniotis, Boris Volosskiy,Jengyi Yu, Hicham Zaid Advances in Patterning Materials and Processes XXXIX（2022）
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