Characterization of diffractive relief structures over large areas by stitching interference microscopic topography
Measurement（2022）
Abstract
•Multi-scale measurement of DOEs based on stitching interference microscopy.•Inherited advantages of high resolution and high accuracy.•Extended lateral range of measurement to 10 mm scale via subaperture stitching.•Simultaneous correction of 6-dof scanning motion error for seamless data fusion.•Full aperture fabrication error map obtained with undercut effect verification.
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Key words
Diffractive optical element,Surface topography,Subaperture stitching,White light interferometry
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