ZrO2-HfO2 Superlattice Ferroelectric Capacitors with Optimized Annealing to Achieve Extremely High Polarization Stability
IEEE Electron Device Letters（2022）
关键词
Atomic layer deposition,ferroelectric capacitor,hafnium zirconium oxide (Hf0.5Zr0.5O2, HZO),HfO2,ZrO2,endurance,reliability,wake-up,fatigue
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