High-quality YIG films preparation by metallo-organic decomposition and their use to fabricate spintronics nanostructures by focused ion beam

High-quality single-phase YIG films prepared by metallo-organic decomposition (MOD) and suitable for the fabrication of ordered nanostructures using a focused ion beam are presented in this work. The YIG films were deposited both on Si and SiO 2 substrates and the cleaning process of the substrate was evaluated as a parameter influencing the film homogeneity. X-ray diffraction and Raman spectroscopy data revealed that a single YIG resulted in all experiments. SEM and AFM showed that films are crack-free with porous morphology and the roughness is smaller than Rq < 0.2 nm. The methodology is scalable and low cost if compared to methods previously described in the literature. The resulting nanostructures are promising for studies in spintronics with thickness between 135 and 180 nm.