Inherent selective pulsed chemical vapor deposition of amorphous hafnium oxide / titanium oxide nanolaminates

Yunil Cho,James Huang,Christopher F. Ahles,Zichen Zhang,Keith Wong,Srinivas Nemani,Ellie Yieh,Andrew C. Kummel

Applied Surface Science（2022）

引用 2|浏览11

暂无评分

摘要

•Selective HfO2/TiO2 nanolaminate pulsed CVD on Si, SiO2 vs SiCOH.•∼20 nm film selectively deposited on Si and SiO2.•The pulsed CVD nanolaminate films were smooth and almost amorphous.•∼20 nm film was selectively deposited on the Cu/SiCOH nanoscale patterned sample.

查看译文

关键词

Inherent selective Deposition,Selective Amorphous Oxide Deposition,Water-Free Deposition,Nanolaminates,Nanoscale Patterning

AI 理解论文

溯源树

样例

生成溯源树，研究论文发展脉络

Chat Paper

正在生成论文摘要