Automatic design of the build-in lens mask for three-dimensional photo lithography

Tomoaki Osumi,Masaru Sasago,Masaaki Yasuda,Yoshihiko Hirai

Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology（2021）

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摘要

Automatic design systems of the Built-in Lens Mask (BILM) for three-dimensional photo lithography will be presented based on conventional feedback control procedure. The 3Dstructure, which is imaged by BILM sometimes missing the pattern due to optical interferences. By optimization of the BILM mask, the optical image becomes fine, smooth and unity.

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关键词

lens mask,three-dimensional

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