La 1− x Sr x MnO 3 Thin Films on Silicon Prepared by Magnetron Sputtering: Optimization of the Film Structure and Magnetic Properties by Postdeposition Annealing

physica status solidi (b)(2021)

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Abstract
Phys. Status Solidi B 2021, 258, 2100307 DOI: 10.1002/pssb.202100307 Published online: October 1, 2021 M. Monecke, P. Richter, D. Bülz, P. Robaschik, D. R. T. Zahn, G. Salvan Semiconductor Physics, Technische Universität Chemnitz, D-09107 Chemnitz, Germany E-mail: [email protected] The authors found a mistake in the sign of the calculated off-diagonal components of the dielectric tensor shown in Figure 9 of their article 10.1002/pssb.202100307. Figure 9 with the correct sign of εxy1 and εxy2, which is now in agreement with ref. [27] of the article, is shown here.
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Key words
magnetron sputtering,thin films,silicon prepared,magnetic properties
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