Parameter Space for Highly Efficient Metasurfaces with E-Beam Lithography in NIR

Jade Martinez-Llinas,Villads Egede Johansen, Yuriy Elesin,Ulrich Quaade

OSA Optical Design and Fabrication 2021 (Flat Optics, Freeform, IODC, OFT)（2021）

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摘要

We investigate the material parameter requirements to fabricate efficient meta- surfaces with e-beam lithography in the NIR: minimum refractive index, minimum aspect ratio and maximum residual layer thickness values needed to reach efficiencies higher than 85%.

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关键词

efficient metasurfaces,nir,e-beam

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