Parameter Space for Highly Efficient Metasurfaces with E-Beam Lithography in NIR
OSA Optical Design and Fabrication 2021 (Flat Optics, Freeform, IODC, OFT)(2021)
摘要
We investigate the material parameter requirements to fabricate efficient meta- surfaces with e-beam lithography in the NIR: minimum refractive index, minimum aspect ratio and maximum residual layer thickness values needed to reach efficiencies higher than 85%.
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关键词
efficient metasurfaces,nir,e-beam
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