Behavior of Polyaniline Particles in Vacuum on Silicon and Sapphire Single-Crystal Substrates

For the first time, studies of the evolution of the morphology of polyaniline (PANI) particles on the surface of silicon (111) and sapphire (0001) in ultra-high vacuum are conducted. It is established by microscopy methods that exposure to ultra-high vacuum leads to the melting of particles with their simultaneous orientation relative to the substrate surface. The possibility of obtaining continuous oriented films by holding PANI particles in vacuum is shown.