A new approach for producing of film structures based on Si1-xGex

I. M. Gavrilin,N. L. Grevtsov, A. Pavlikov,A. A. Dronov,E. B. Chubenko,V. P. Bondarenko, S. A. Gavrilov

Materials Letters（2022）

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摘要

•A new approach for producing of film structures based on Si1-xGex.•An alloy of the composition Si0.4Ge0.6 has been obtained.•Crystallization of a melt with a higher Si concentration occur at lower temperature.

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关键词

Electrodeposition,Si1-xGex films,Germanium nanowires,Porous silicon

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