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Synthesis and Application of a Thiol Photolabile Protecting Group

Hongpeng Yang, Lei Chen,Shouguo Zhang,Gang Wang,Tingting Chen,Jing Xu,Tao Peng,Lin Wang,Liming Hu

CHEMISTRYSELECT（2022）

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Abstract
We successfully designed and synthesized a photolabile protecting group (PLPG) for thiol that can be rapidly photolyzed by irradiation at 365 nm to release thiol groups within 100 s. The photolytic reaction has mild conditions and avoids acid cleavage, leading to good yields with no side reactions as validated by HPLC. The PLPG has good acid/alkali tolerance
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Key words
Acid, alkali tolerance, Photolabile Protecting Group (PLPG), Photolysis yield, Thiol groups
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