Simple preparation of nanoporous ITO film with novel sparking method
Materials Letters（2022）
Abstract
•Nanopore structure of ITO films was simply fabricated by sparking method.•Film thickness 510 nm provides great electrical conductivity and transparency.•The intensity of (222) diffraction peak is obviously strong for annealing at 500 °C.•Resistivity of 4.6 × 10−3 Ω.cm and transmittance of 84% were obtained in this work.
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Key words
porous ITO film,Low resistivity,Transparency,Sparking method
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