Aligned multiphoton lithography

In this invited presentation we introduce aligned multiphoton lithography (AML®). In contrast to traditional mask(less) aligners based on one-photon lithography, in AML®, 3-dimensional shapes can be generated and aligned to 3-dimensional topographies. The unique resolution and design freedom of AML® opens new horizons for optical applications, hybrid photonic integration, MEMS, medicine, or life science applications. In this session we present the design and fabrication of micro-optical elements aligned to fiber tips, chip edge couplers, and laser output facets. The characterization of these elements is in very good agreement with simulations allowing us to also present experiments demonstrating low-loss coupling between the elements.