Wavefront sensors and adaptive optics for optical metrology, laser and microscopy

We will present a new approach of linearized focal plane technique (LIFT), formerly developed by ONERA, which results in an improvement of a factor of 16 (4x4) of the spatial resolution. This technology is based on the combination of standard SH technology with phase retrieval algorithms applied on all spots of the microlens array that provides information on high spatial frequencies. We will show some measurements performed on extremely complex wavefronts. This technology presents very promising perspectives for optical and freeform metrology and can advantageously replace, at lower cost and better usability, Fizeau interferometry.