Study on the Dual RF Plasma Enhanced Pulsed Laser Deposition of Titanium Nitride Thin Film

H. Bhuyan, M. Escalona, S. Ibacache, M.J. Retamal,J.C. Valenzuela,F. Veloso, M. Favre, E. Wyndham,P. Saikia, C. Borgohain

2020 IEEE International Conference on Plasma Science (ICOPS)（2020）

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摘要

Physics and application of a dual radio frequency plasma enhanced pulsed laser deposition (RFPE-PLD) system will be presented. Titanium nitride (TiN) thin films are prepared using the RFPE-PLD system at different experimental conditions to investigate the effect of the background dual RF plasma during PLD deposition. The feasibility of obtaining control over the thin film characteristics at different experimental conditions including surface topography, nitrogen concentration and the deposition rate will be discussed. In order to investigate the correlation between the deposited film properties and the plasma parameters, the electron density and plasma temperature are estimated by using an RF compensated Langmuir probe.

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关键词

dual RF plasma enhanced pulsed laser deposition,titanium nitride thin film,dual radio frequency plasma,laser deposition system,RFPE-PLD system,background dual RF plasma,PLD deposition,thin film characteristics,surface topography,deposition rate,deposited film properties,plasma parameters,electron density,plasma temperature,nitrogen concentration,RF compensated Langmuir probe,TiN

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