640×512 back illuminated EMCCD

Qingfei Liu, Jianqiang Zhao,Shuxi Xu,Fang Dai, Jixue Chen, Wei Zhang, Yichen Duan

Eighth Symposium on Novel Photoelectronic Detection Technology and Applications（2022）

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摘要

640×512 back illuminated EMCCD is based on 640×512 front-face illuminated EMCCD. It is manufactured by wafer bonding, back thinning, laser annealing, film sputtering and other back illumination processes. After parameter test and imaging verification, 640×512 back illuminated EMCCD has the characteristics of high quantum efficiency, high detection sensitivity and anti-blooming, which is suitable for imaging in low illumination environment.

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