Trap Capture and Emission Dynamics in Ferroelectric Field-Effect Transistors and their Impact on Device Operation and Reliability

2021 IEEE International Electron Devices Meeting (IEDM)(2021)

引用 4|浏览18
暂无评分
摘要
We track carrier capture and emission dynamics during write operations in n-type ferroelectric-field-effect transistors (FEFETs) by directly and separately measuring the trap related hole and electron currents through the body terminal and shorted source-drain, respectively. Both electron and hole currents are simultaneously observed during polarization switching, irrespective of whether the chann...
更多
查看译文
关键词
Silicon compounds,Electron traps,Memory management,Switches,Fatigue,Iron,Transistors
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要