Trap Capture and Emission Dynamics in Ferroelectric Field-Effect Transistors and their Impact on Device Operation and Reliability
2021 IEEE International Electron Devices Meeting (IEDM)(2021)
摘要
We track carrier capture and emission dynamics during write operations in n-type ferroelectric-field-effect transistors (FEFETs) by directly and separately measuring the trap related hole and electron currents through the body terminal and shorted source-drain, respectively. Both electron and hole currents are simultaneously observed during polarization switching, irrespective of whether the chann...
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关键词
Silicon compounds,Electron traps,Memory management,Switches,Fatigue,Iron,Transistors
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