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Thermal mode photo-resistor process and applications

Hsiu Wen Wu,Ming-Chia Li,Chin Tien Yang,Chung Ta Cheng,Shuen Chen Chen,Der-Ray Huang

Joint International Symposium on Optical Memory and Optical Data Storage, ISOM_ODS 2011（2011）

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Abstract
In this study, we report on use the thermal lithography technology to prepare the submicron structure for antireflection application.
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Key words
Nanolithography Techniques,Electron Beam Lithography,Nanofabrication,Resolution Limits
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