High contrast patterns generated by phase-seeded CGH extensible to 3-D patterns and binary modulation.

(2015). Digital holography and three-dimensional imaging : 24-28 May 2015, Shanghai, China ; OSA annual topical meeting. Washington: Optical Society of America, pp. DTh4A.4, OSA technical digest(2015)

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摘要
By pre-seeding the phase distribution of a point-oriented CGH, controlled-width line patterns are generated with high contrast (>0.6) for precision imaging applications such as photolithography. The approach is extensible to binary phase CGH and 3-D line patterns.
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