FinFET技術のためのサブ10-9Ω‐cm2n型接触抵抗率Niimi Hiroaki,Liu Zuoguang,Gluschenkov Oleg,Mochizuki Shogo,Fronheiser Jody,Li Juntao,Demarest James,Zhang Chen, Liu Bei,Yang Jie,Raymond Mark,Haran Bala,Bu Huiming,Yamashita TenkoIEEE Electron Device Letters(2016)引用 0|浏览1暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要