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In-line Characterization of Non-Selective SiGe Nodule Defects with Scatterometry Enabled by Machine Learning

Dexin Kong,Robinhsinkuo Chao,Mary Breton,Chi-chun Liu,Gangadhara R. Muthinti,Soon-Cheon Seo,Nicolas J. Loubet,Pietro Montanini,John Gaudiello,Veeraraghavan Basker,Aron J. Cepler, Susan Ng-Emans,Matthew Sendelbach, Itzik Kaplan,Gilad Barak,Daniel Schmidt,Julien Frougier

Metrology, Inspection, and Process Control for Microlithography XXXII（2018）

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