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Performance of Stacked Nanosheet Gate All Around FET’s with EUV Patterned Gate and Sheets

Indira Seshadri,Jennifer Church, Prateek Hundekar,Mary Breton,Jingyun Zhang,Eric Miller,Andrew Greene,Julien Frougier, Chris Waskiewicz,Tao Li,Tsung-Sheng Kang,Daniel Dechene,Carl Radens,Stuart Sieg,Veeraraghavan Basker,Nelson Felix,Chris A. Mack

Extreme Ultraviolet (EUV) Lithography XII（2021）

Cited 2|Views30
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