TEUS: high-brightness EUV LPP light source based on fast rotating target: product overview and specifications
International Conference on Extreme Ultraviolet Lithography 2021(2021)
摘要
We present performance metrics for the commercially available TEUS product line. TEUS-S is a high-brightness EUV LPP light source based on a fast rotating liquid metal target with EUV collection angle of 0.05sr. The TEUS-S100 and S400 models employing 100W and 400W of average laser power respectively have been characterized wi0th particular attention to the collector optics lifetime. It is estimated that 10% mirror reflectivity degradation will occur after 2 years for the TEUS-S100 and after 0.5 year for the TEUS-S400 in 24/7operation mode.
The TEUS-S400 source provides more than 30 mW of in-band (±1%) EUV radiation after the debris mitigation system.
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关键词
light,high-brightness
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