Thermal Silicidation of Ni/SiGe and Characterization of Resulting Silicide Films Using Raman Spectroscopy and X-ray Diffraction

For advanced application specific devices, combinations of Si/Ge, Ge/Si, Si1-xGex/Si are frequently introduced in the device fabrication process. Epitaxy, condensation and annealing processes are commonly used for controlling the Ge content to a desired level. Strain and crystallinity can be affected by a small variation in composition or Ge content, which can result in device performance deterioration or failure. Thus, the composition, strain and crystallinity must be carefully monitored and controlled throughout the manufacturing process. The electrode formation process is also very critical for successful device fabrication. Any spikes and/or electrically active defects near junctions can be fatal to the device yield. Silicidation processes and resulting silicides must be investigated as much as possible using various non-invasive material characterization techniques. In this study, we report the thermal silicidation characteristics of Ni/Si1-xGex with various Ge content under different annealing temperatures in the range of 225oC ~ 400oC in N2 ambient. Thermal silicidation was performed in a stacked hotplate-based SAO-302LP system designed for 300mm wafers. For resulting silicide characterization, measurements of sheet resistance, Raman spectra, X-ray diffraction curves as well as scanning electron microscopy (SEM) observations were performed. We have studied Ge content and annealing temperature dependence on the resulting electrical and crystallographic silicide characteristics. Figure 1 shows 647nm excited Raman spectra and X-ray diffraction (XRD) curves from reference Si, and resulting silicide from Ni/Si0.75Ge0.25 before and after annealing under at 235oC, 310oC and 400oC. Raman spectra and sheet resistance measurements showed silicide formation and silicide layer thickening with increasing annealing temperature. XRD curves clearly indicated the change of crystalline phase of resulting silicide with annealing temperature increase. Various aspects of thermal silicidation and its characterization will be discussed at the conference. Figure 1