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Delayering on Advanced Process Technologies Using FIB

Pete Carleson,David Donnet,Oleg Sidorov,Chad Rue

International Symposium for Testing and Failure AnalysisISTFA 2014: Conference Proceedings from the 40th International Symposium for Testing and Failure Analysis（2014）

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Abstract
Abstract Good control over beam and chemistry conditions are required to enable uniform delayering of advanced process technologies in the FIB. The introduction of newer, thinner and more beam sensitive materials have made delayering more complicated. We shall introduce a new chemistry for device delayering and present results from both Ga and Xe ion beams showing its improvement over existing chemistries.
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advanced process technologies
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