Delayering on Advanced Process Technologies Using FIB
International Symposium for Testing and Failure AnalysisISTFA 2014: Conference Proceedings from the 40th International Symposium for Testing and Failure Analysis(2014)
Abstract
Abstract Good control over beam and chemistry conditions are required to enable uniform delayering of advanced process technologies in the FIB. The introduction of newer, thinner and more beam sensitive materials have made delayering more complicated. We shall introduce a new chemistry for device delayering and present results from both Ga and Xe ion beams showing its improvement over existing chemistries.
MoreTranslated text
Key words
advanced process technologies
AI Read Science
Must-Reading Tree
Example
![](https://originalfileserver.aminer.cn/sys/aminer/pubs/mrt_preview.jpeg)
Generate MRT to find the research sequence of this paper
Chat Paper
Summary is being generated by the instructions you defined