Work Function and Effective Oxide Thickness Engineering via Alloying of Metal Gate ElectrodesJamie Schaeffer,Mark Raymond,David Gilmer,Rich Gregory,Bill Taylor,Jack Jiang,Dina Triyoso,Rama Hegde,Sri SamavedamECS Meeting Abstracts(2008)引用 0|浏览0暂无评分摘要Abstract not Available.更多查看译文AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要