Research of high-performance DLC Film on Si Substrate by Pulsed Laser Deposition

Abstract Femtosecond pulsed laser was used to deposit DLC films. Through methods of oxygen ambient and mixing silicon, no-hydrogen DLC films were deposited with more excellent transmission, hardness, adhesion and stability than those by chemical vapor deposition or traditional pulsed laser deposition (PLD). The transmission of 3∼5μm band was larger than or equal to 91.7%, and the hardness up to 40∼50GPa. All the films passed the tests of high temperature, low temperature, salt-fog and heavy-friction tests. The performances of the samples satisfied optical engineering need.