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Integrated Carbon Cleaning and Oxide Cleaning on Si and SiGe in a Single Process Module

Fei Wang,Bubesh Babu Jotheeswaran,John Tolle, Alex Demos

ECS Transactions（2019）

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Abstract
We present ASM's next generation epi pre-clean solution, a single process module that integrates both carbon cleaning and oxide cleaning, using hydrogen radical chemistry and fluorine radical chemistry, respectively.
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Key words
oxide cleaning,sige,integrated
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