Enhancing the Performance of Ni-In0.53Ga0.47As MOSFETs Using Post Silicon Dopant Process
Extended Abstracts of the 2017 International Conference on Solid State Devices and Materials(2017)
Key words
CMOS Scaling,Double-Gate Transistors,Semiconductor Physics,High-Performance Nanoscale Devices
AI Read Science
Must-Reading Tree
Example
![](https://originalfileserver.aminer.cn/sys/aminer/pubs/mrt_preview.jpeg)
Generate MRT to find the research sequence of this paper
Chat Paper
Summary is being generated by the instructions you defined